| 1. Compact and Space-Saving Design | The bench-top configuration is ideal for laboratories and R&D environments where space is limited, while still delivering professional plasma treatment performance. |
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| 2. Precise and Controlled Processing | The 300W plasma power provides stable and gentle plasma discharge, making it suitable for small, sensitive, or high-value components. |
| 3. Accurate Gas Flow Management | Equipped with standard 2 MFCs (Ar and O₂), the system ensures precise gas mixing and consistent process repeatability for reliable surface modification results. |
| 4. Flexible Sample Handling | The 3 standard working trays, customizable to specific part geometries, allow eRicient organization of samples and improved treatment uniformity across different applications. |
The bench-top 10-Liter Vacuum Plasma Treatment System VL-10-A is a compact and space-saving solution designed for laboratory research, prototyping, and small-batch production. Equipped with a stable 300W plasma generator, it provides precise and uniform surface cleaning and activation for delicate or small components. The Siemens PLC control system ensures reliable operation, easy parameter adjustment,and repeatable process management. Standard configuration includes 2 MFCs (Ar and O₂) for accurate gas control, along with 3 customizable working trays to accommodate diRerent sample sizes and application needs.
| Plasma Main Unit | Dimension (L*W*H) | 700*720*680mm |
| Chamber (L*W*H) (customizable) | 270*280*180mm | |
| Weight w/o Pump | 170 kg | |
| Plasma Power Supply | Plasma Power Supply | 13.56MHz / 40kHz (opt.) |
| Power Rating | 300W | |
| Control System | Control Method (PLC) | Siemens – SIMATIC HMI Smart 700 IE V5 |
| Display | 7″ Touch Screen | |
| Vacuum System | Chamber Material | Stainless Steel |
| Chamber Leak Rate | > 15Pa/s | |
| Ultimate Vacuum | < 5Pa/s | |
| Process Layers (customizable) | 3 pcs (Wire Mesh) | |
| Venting Time | ≤ 15s | |
| Pump Down Time | 20s~40s | |
| Vacuum Pump | 24m³/h | |
| Pump Type | Oil-Sealed Pump or Dry Pump (opt.) | |
| Gas System | Process Gas Flow Range | 0-300SCCM |
| Process Gas Lines | Standard (Ar/O2) with 2 MFCs | |
| Facility Requirements | Equipment Power Supply | AC220 ( ±10%) |
| Equipment Gas Source (Air Supply) | ≥ 0.4MPa | |
| Equipment Power | 1.8kW | |
| Operating Environment | 0°C – 50°C |
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